- All sections
- H - Electricity
- H05H - Plasma technique; production of accelerated electrically- charged particles or of neutrons; production or acceleration of neutral molecular or atomic beams
- H05H 7/06 - Two-beam arrangements; Multi-beam arrangements
Patent holdings for IPC class H05H 7/06
Total number of patents in this class: 32
10-year publication summary
|
4
|
2
|
3
|
3
|
3
|
2
|
1
|
3
|
2
|
0
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 6816 |
5 |
| Jefferson Science Associates, LLC | 106 |
3 |
| Tsinghua University | 5426 |
2 |
| Oxford University Innovation Limited | 1421 |
2 |
| Paul Scherrer Institut | 299 |
2 |
| Siemens AG | 24990 |
1 |
| Varian Semiconductor Equipment Associates, Inc. | 1282 |
1 |
| Lawrence Livermore National Security, LLC | 1834 |
1 |
| Cornell University | 3036 |
1 |
| Elekta Limited | 178 |
1 |
| Gigaphoton Inc. | 1120 |
1 |
| INFICON, Inc. | 66 |
1 |
| ION Beam Applications S.A. | 187 |
1 |
| Muons, Inc. | 24 |
1 |
| Nuctech Company Limited | 1275 |
1 |
| The Science and Technology Facilities Council | 54 |
1 |
| Technische Universitat Darmstadt | 258 |
1 |
| China Institute of Atomic Energy | 30 |
1 |
| IPRBOX Oy | 9 |
1 |
| Aima Developpement | 7 |
1 |
| Other owners | 3 |